Continuous Polish Filtration
A Closer Look at Continuous Polish Filtration
In our continuous polish filtration unit, a solution of the reagent passes through a fine‐media dead-end filter under pressure. Inline process analytical technology (PAT) monitors turbidity, pressure, and throughput in real-time. The clarified filtrate stream is conveyed to a continuous reactor system. Over time, the pressure differential across the filter increases as particulates accumulate on the filter surface. At a defined pressure set point value, the feed solution is diverted to a parallel filter module, and the fouled filter module undergoes an automated cleaning cycle, restoring its integrity. The parallel filter module operates until its fouling threshold is reached, at which point it undergoes a similar switch to the previous filter, and the fouled filter is automatically cleaned-in-place and regenerated. This alternating cycle enables uninterrupted polish filtration and consistent solution clarity.
Key Features of CONTINUUS’ Continuous Polish Filtration
- Uninterrupted process operation over many fouling/cleaning cycles
- Continuous process monitoring improves process control and quality
- Filter media porosity from 0.1 μm to 25 μm
- PTFE, SS316, and Hastelloy readily available
Advanced Manufacturing Expertise to Guide Implementation of Continuous Polish Filtration
We offer comprehensive process development and integration services for all continuous manufacturing unit operations.
Integrated Continuous Manufacturing
/ API
- Flow Chemistry Reaction
- Polish Filtration
- Crystallization
- Solvent Recovery
- Filtration
- Drying
Unit OP Multi-Step
- Extrusion
- Injection Molding
- Coating
Plug-and-Play Unit Operations & Supporting Technologies
CONTINUUS’s modular, plug-and-play unit operations are engineered for seamless integration and rapid configuration and re-configuration. These units can operate as part of an ICM line or be implemented individually, enabling flexible deployment tailored to each program’s needs.
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