An automated continuous polish filtration system was developed at CONTINUUS to remove the suspended particulate matter (SPM) from a solution prior to a reactive crystallization. The continuous polish filtration system is comprised of a pair of filters working in tandem. When the pressure of the operating filter reaches a pre-established maximum limit, the process stream is automatically diverted to the secondary filter. Concurrently, back wash solvent flows in the reverse direction through the clogged filter, which cleans and prepares the filter for the next cycle. The flow is regulated by a fully automated process control system that monitors and records the real time pressure drop across the filters.